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Reverse resistance switching in polycrystalline Nb2O5 films
- Jo, Younghun;
- Sim, Hyunjun;
- Hwang, Hyunsang;
- Ahn, Ken;
- Jung, Myung-Hwa
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10초록
The reverse resistance switching is observed in polycrystalline Nb2O5 film, which is one of promising candidates for nonvolatile resistance random access memory (ReRAM) devices. This reverse switching is compared with the usual behavior, in which the switching voltage V-LH from low resistance (LR) to high resistance (HR) states is lower than V-HL from HR to LR states. Based on these experiments, we propose a phenomenological mechanism for the resistance switching, which assumes the coexistence of LR and HR phases and the percolation transition. (C) 2009 Published by Elsevier B.V.
키워드
Resistance switching; Percolation; Magnetic polaron; Niobium oxides; NIO FILMS; OXIDE-FILMS; THIN-FILMS; MANGANITES
- 제목
- Reverse resistance switching in polycrystalline Nb2O5 films
- 저자
- Jo, Younghun; Sim, Hyunjun; Hwang, Hyunsang; Ahn, Ken; Jung, Myung-Hwa
- 발행일
- 2010-08-02
- 유형
- Article; Proceedings Paper
- 저널명
- Thin Solid Films
- 권
- 518
- 호
- 20
- 페이지
- 5676 ~ 5678