Synthesis and photoresist characteristics of a polyimide with photodegradable structure in polymer main chain

초록

A novel photodegradable polyimide, PNSI, having cyclobutane and sulfonyloxyimide moieties in the polymer main chain was synthesized by condensation polymerization of N,N'-dihydroxycycloburanetetracarboxylic diimide and 2,6-naphthalenedisulfonyl chloride. The yield and molecular weight of PNSI are significantly influenced by polymerization solvents and time. Thermal properties and the photodegradation behavior of the polymer were investigated by thermogravimetric analysis (TGA), differential scanning calorimetry, UV-Visible and FT-IR spectroscopy. It has been found that the photodegradation of PNSI by irradiation with deep UV (DUV) results from both scission of cyclobutane rings and N-O bonds in the polymer backbone by FT-IR and GC-MS analysis. The PNSI rendered positive-tone images by exposure to 254 nm DUV and developing with TNF. Thus, PNSI has the capability of positive-working photoresist materials in the DUV region.

키워드