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Polyurethane triblock copolymer gate dielectrics for low-voltage organic thin-film transistors
- Kim, Dongkyu;
- Kim, Choongik;
- Earmme, Taeshik
WEB OF SCIENCE
9SCOPUS
9초록
Novel polyurethane triblock copolymers comprising polycaprolactone diol (PCL), 1,6-hexamethylene diisocyanate (HMDI), and polyethylene glycol (PEG) were synthesized for use as gate dielectric for organic thin-film transistors (OTFTs). Thin films of polyurethane gate dielectrics processed from solution exhibit excellent insulating properties (similar to 7 x 10(-7) A/cm(2) at 1 V) as well as large areal capacitance (170 nF/cm(2)) with film thickness of similar to 50 nm. OTFTs are fabricated with representative n-channel organic semiconductor (N,N'-ditridecylperylene-3,4,9,10-tetracarboxylic diimide; PTCDI-C13) using the developed gate dielectrics, and the resulting devices show decent electrical performance with negligible hysteresis at low operating voltage of 1 V. (C) 2018 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.
키워드
- 제목
- Polyurethane triblock copolymer gate dielectrics for low-voltage organic thin-film transistors
- 저자
- Kim, Dongkyu; Kim, Choongik; Earmme, Taeshik
- 발행일
- 2019-03-25
- 유형
- Article
- 권
- 71
- 페이지
- 460 ~ 464