In-situ rf plasma treatment of multi-wall carbon nanotubes with various reactive gases for enhanced field emission

  • Ahn, KS
  • Kim, JH
  • Lee, KN
  • Lee, CH
  • Kim, CO
  • ... Cheong, H
  • 외 2명
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초록

Well-aligned multi-wall carbon nanotubes (MWNTs) were fabricated at a low temperature of 400 degreesC by utilizing a radio-frequency plasm a-enhanced chemical vapor deposition (rf-PECVD) system. The MWNTs were in-situ treated with external rf plasma sources, such as hydrogen (H-2) and ammonia (NH3), in order to enhance the structural and electrical properties of the MWNTs. Structural properties of carbon nanotubes were investigated by using scanning electron microscopy, Fourier transform infrared spectroscopy, energy-dispersive spectrometry and transmission electron microscopy. Finally, the emission properties of the MWNTs treated with various gases were also measured, for application in field emission displays in the near future.

키워드

carbon nanotubesurface treatmentfield emission currentPURIFICATIONNANORODS
제목
In-situ rf plasma treatment of multi-wall carbon nanotubes with various reactive gases for enhanced field emission
저자
Ahn, KSKim, JHLee, KNLee, CHKim, COHong, JPJeon, YJCheong, H
발행일
2004-07
유형
Article; Proceedings Paper
저널명
Journal of the Korean Physical Society
45
1
페이지
154 ~ 157