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AFM study of phase-separated morphology in immiscible blend thin films
- Seo, Young-Soo;
- Kim, Eusung;
- Kwon, Soo Yong;
- Jing, Huaiyu;
- Shin, Kwanwoo
Citations
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6초록
Phase-separation behavior of polystyrene (PS) and poly(methyl methacrylate) (PMMA) 1:1 blend film has been studied as a function of film thickness and component by adding PS-b-PMMA diblock copolymer. After annealing, PS is phase-separated into circular-shaped bumps on a PMMA layer. The bump number is inversely proportional to the film thickness in log-log plot while the slope is invariable for the blends with and without 5% PS-b-PMMA diblock copolymer. The bump size and inter-bump spacing are also affected by both the film thickness and addition of the block copolymer. (C) 2008 Elsevier B.V. All rights reserved.
키워드
polymer thin film; nanopatterning; scanning probe microscopy; nanostructures; SURFACE-MORPHOLOGY; POLYMER; POLYSTYRENE; BILAYERS
- 제목
- AFM study of phase-separated morphology in immiscible blend thin films
- 저자
- Seo, Young-Soo; Kim, Eusung; Kwon, Soo Yong; Jing, Huaiyu; Shin, Kwanwoo
- 발행일
- 2008-09
- 유형
- Article; Proceedings Paper
- 저널명
- Ultramicroscopy
- 권
- 108
- 호
- 10
- 페이지
- 1186 ~ 1190