Microstructure study of amorphous vanadium oxide thin films using raman spectroscopy

  • Lee, SH
  • Cheong, HM
  • Je Seong, M
  • Liu, P
  • Tracy, CE
  • 외 3명
Citations

WEB OF SCIENCE

107
Citations

SCOPUS

110

초록

Microstructural changes of amorphous V2O5 films with lithium intercalation are studied using Raman-scattering measurements. The Raman spectra of as-deposited films show two broad peaks around at 520 and 650 cm(-1), due to the stretching modes of the V-3-O and V-2-O bonds, respectively, and a relatively sharp peak at 1027 cm(-1) due to the V5+=O stretching mode of terminal oxygen atoms. In addition, there is a peak at 932 cm(-1) that we attribute to the V4+=O bonds. Comparison of the Raman spectra of V2O5 films with different oxygen deficiencies confirms this assignment. This Raman peak due to the stretching mode of the V4+=O bonds develops and shifts toward lower frequencies with increasing lithium concentration. Comparison to results from gasochromic hydrogen insertion indicates that the 932 cm(-1) Raman peak is not a result of vibrations which involve Li or H atoms. We propose that the V4+=O bonds are created by two different mechanisms: a direct conversion from V5+=O bonds and the breaking of the single oxygen bonds involving V4+ ions. (C) 2002 American Institute of Physics.

키워드

OPTICAL-PROPERTIESNICKEL-OXIDEV2O5LITHIUMPENTOXIDEMECHANISMBEHAVIORINTERCALATIONGLASS
제목
Microstructure study of amorphous vanadium oxide thin films using raman spectroscopy
저자
Lee, SHCheong, HMJe Seong, MLiu, PTracy, CEMascarenhas, APitts, JRDeb, SK
DOI
10.1063/1.1495074
발행일
2002-08-15
유형
Article
저널명
Journal of Applied Physics
92
4
페이지
1893 ~ 1897