Computational analysis of the interfacial effect on electromigration in flip chip solder joints

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초록

Recent experiments have shown failure in flip chip micro solder joints induced by electromigration. This paper proposes a three-dimensional computational model to simulate the evolution of micro and sub-micro scale solder joints due to electromigration induced diffusion. The evolving morphology of the solder joint related with multiple mechanisms causes a computational challenge. This is addressed by employing a diffuse interface model with multiple concentrations. To efficiently resolve complications, a semi-implicit Fourier spectral scheme and a biconjugate-gradient method are adopted. Results have demonstrated rich dynamics and solder breakage at the interface on the cathode side. Furthermore, the effect of the designed interface region on the reliability of solder joints has been investigated with the developed model. (C) 2009 Elsevier B.V. All rights reserved.

키워드

ElectromigrationSolder jointThe interface energyDiffuse interface modelINTERCONNECTSFAILURE
제목
Computational analysis of the interfacial effect on electromigration in flip chip solder joints
저자
Kim, Dongchoul
DOI
10.1016/j.mee.2009.03.044
발행일
2009-10
유형
Article
저널명
Microelectronic Engineering
86
10
페이지
2132 ~ 2137