Development and application of a direct beam lithography for the bioelectronic device

초록

Direct beam patterning on meral/protein/organic material coated ITO substrates is investigated using laser light for submicron scale lithography. A laser writing lithography method is developed using the 400nm Ti:Sapphire laser. Using a microscope objective lens, a laser beam is focused onto a glass slide coated with metal/protein/organic material film. Localized laser absorption results in partial melting and ablation of film. Spatially moving the laser spot, a stable etched pattern is obtained at submicron resolution. This result opens many possibilities for microfabrication of bioelectronic devices.

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