Nondestructive characterization of surface resistance for copper(II) phthalocyanine thin films using a near-field scanning microwave microscope

Park, Miehwa; Yoo, Hyunjun; Lim, Eunju; Kim, Jae-Yong; Lee, Kiejin; Friedman, Barry

doi:10.1016/j.jcrysgro.2004.11.279

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Nondestructive characterization of surface resistance for copper(II) phthalocyanine thin films using a near-field scanning microwave microscope

Park, Miehwa;
Yoo, Hyunjun;
Lim, Eunju;
Kim, Jae-Yong;
Lee, Kiejin;
외 1명

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초록

We observed the surface resistance of copper(II) phthalocyanine (Cu-Pc) thin films dependence on substrate heat-treatment conditions by a nondestructive characterization method using a near-field scanning microwave microscope (NSMM) at an operating frequency f = 5.2-5.3 GHz. The changes in surface resistance were investigated by NSMM by measuring the reflection coefficient S-11. The surface resistance of Cu-Pc thin films depends on the grain alignment. When the Cu-Pc thin films were annealed at 150 degrees C for 3 h, the films are aligned with the b-axis normal to the substrate and have a lower surface resistance. (C) 2004 Elsevier B.V. All rights reserved.

키워드

Near-field scanning microwave microscope; Surface resistance; Surface structure; Copper(II) phthalocyanine; Organic compound; STATIC INDUCTION TRANSISTOR

제목: Nondestructive characterization of surface resistance for copper(II) phthalocyanine thin films using a near-field scanning microwave microscope

저자: Park, Miehwa; Yoo, Hyunjun; Lim, Eunju; Kim, Jae-Yong; Lee, Kiejin; Friedman, Barry

DOI: 10.1016/j.jcrysgro.2004.11.279

발행일: 2005-02-15

유형: Article

저널명: Journal of Crystal Growth

권: 275

호: 1-2

페이지: E1863 ~ E1867