Studies of surface resistance of copper(II) phthalocyanine thin films by using a near-field scanning microwave microscope

초록

We observed the surface resistance of copper(II) phthalocyanine (Cu-Pc) thin films dependence on substrate heating temperature by using a near-field scanning microwave microscope (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f = 4.5-5.5 GHz. The crystal structures and surface resistance of Cu-Pc thin films due to different heating temperatures were observed by using X-ray diffraction including the 20 and phi-scan and the near-field scanning microwave microscope. As the temperatures increased from room temperature to 200 degreesC, the crystal structure of Cu-Pc, thin films was transformed from monoclinic alpha-Phase to thermally stable monoclinic beta-Phase. The changes in surface resistance of Cu-Pc thin films due to different substra te heating temperatures were investigated by NSMM by measuring the reflection coefficient S-11. The surface resistance of Cu-Pc thin films depends on the morphology and crystal alignment of these films. When the substrate temperature for deposition was 150 degreesC, the minimum surface resistance of Cu-Pc thin films was obtained. (C) 2004 Elsevier B.V. All rights reserved.

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