Studies on the structure and surface resistance of copper(II) phthalocyanine thin films by using a near-field scanning microwave microscope

초록

We observed the dependence of the surface resistance of copper (II) phthalocyanine (Cu-Pc) thin films on substrate heating temperatures by using a near-field scanning microwave microscope (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f = 5.2-5.7 GHz. The crystal structures and surface resistance of Cu-Pc thin films due to different heating temperatures were observed by using X-ray diffraction and the NSMM. As the temperature increased from room temperature to 270 degrees C, the crystal structure of Cu-Pc thin films was transformed from alpha-phase to thermally stable beta-phase. The changes in surface resistance of Cu-Pc thin films due to different substrate heating temperatures were investigated by NSMM by measuring the reflection coefficient S-11. The surface resistance of Cu-Pc thin films depends on the morphology and crystal alignment of these films. When the Cu-Pc thin film was annealed at 150 degrees C for 3 h, the minimum surface resistance of Cu-Pc thin films was obtained.

키워드