Dual sulfur-specific pathways in Ag-sensitized Cr2O3 Nanoarchitectures for robust H2S discrimination in complex gas mixtures

  • Chung, Jae Han
  • An, Do Yeong
  • Choi, Woo-Seok
  • Cho, Yun-Haeng
  • Ko, Eun Ji
  • ... Jeong, Keunhong
  • 외 7명
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초록

Highly selective detection of hydrogen sulfide (H2S) in complex gas mixtures is essential for occupational safety, yet remains challenging due to non-specific redox reactions. In this study, we report highly selective H2S sensors based on Ag-sensitized Cr2O3 nanoarchitectures fabricated via glancing-angle deposition. The superior sensing performance is fundamentally driven by dual sulfur-specific pathways: the AgxO-to-AgxS conversion and the transient sulfidation of the Cr2O3 surface. At an optimal Ag thickness of 3 nm, the sensors exhibit a maximum response of 107.2 to 10 ppm H2S at 300 degrees C, representing a 7.2-fold enhancement over bare Cr2O3. Notably, the sensor maintains strong discrimination against representative interferents (e.g., CH3COCH3, NH3, HCHO, CH4, and CO) and excellent repeatability (coefficient of variation, CV <= 7%) under both dry and 80% RH conditions. Experimental evidence from in-situ Raman and XPS analyses confirms that the sulfur-driven pathways collapse the hole accumulation layer, ensuring an H2S-dominant response even in chemically competitive environments. This work establishes a mechanism-driven design principle for robust H2S discrimination, positioning such nanoengineered architectures as a reliable platform for real-time industrial monitoring and biomedical applications.

키워드

Gas sensorGas mixtureH2S discriminationAgSENSING PROPERTIESMETAL-OXIDESCO ADSORPTIONSENSORSSURFACETEMPERATURESELECTIVITYACETONESITESIR
제목
Dual sulfur-specific pathways in Ag-sensitized Cr2O3 Nanoarchitectures for robust H2S discrimination in complex gas mixtures
저자
Chung, Jae HanAn, Do YeongChoi, Woo-SeokCho, Yun-HaengKo, Eun JiAn, Jun YoungSong, Young GeunLee, Jeong-OJeong, KeunhongNah, Yoon-ChaeSeo, Jung HwanShim, Young-SeokCho, Donghwi
DOI
10.1016/j.cej.2026.177723
발행일
2026-08
유형
Article
저널명
Chemical Engineering Journal
542