ScholarWorks@서강대학교

상세 보기

Removal the Photo-resist residue on the metal patterned wafer using supercritical carbon dioxide without fluorinated surtactant

  • 임종성
제목
Removal the Photo-resist residue on the metal patterned wafer using supercritical carbon dioxide without fluorinated surtactant
저자
임종성
발행일
2008-12-22
학회명
한국초임계유체학회/학술대회

ScholarWorks@서강대학교

04107 서울특별시 마포구 백범로 35 (신수동) 서강대학교 Tel. 02-705-8114

COPYRIGHT © 서강대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.